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Fluidized bed silicon deposition from silaneA process and apparatus for thermally decomposing silicon containing gas for deposition on fluidized nucleating silicon seed particles is disclosed. Silicon seed particles are produced in a secondary fluidized reactor by thermal decomposition of a silicon containing gas. The thermally produced silicon seed particles are then introduced into a primary fluidized bed reactor to form a fludized bed. Silicon containing gas is introduced into the primary reactor where it is thermally decomposed and deposited on the fluidized silicon seed particles. Silicon seed particles having the desired amount of thermally decomposed silicon product thereon are removed from the primary fluidized reactor as ultra pure silicon product. An apparatus for carrying out this process is also disclosed.
Document ID
20080005854
Acquisition Source
Headquarters
Document Type
Other - Patent
Authors
Hsu, George
Levin, Harry
Hogle, Richard A.
Praturi, Ananda
Lutwack, Ralph
Date Acquired
August 24, 2013
Publication Date
April 24, 1984
Subject Category
Chemistry And Materials (General)
Report/Patent Number
Patent Number: US-PATENT-4,444,811
Patent Application Number: US-PATENT-APPL-SN-327256
Distribution Limits
Public
Copyright
Work of the US Gov. Public Use Permitted.
Patent
US-PATENT-4,444,811
Patent Application
US-PATENT-APPL-SN-327256
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