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Strained layer InP/InGaAs quantum well laserStrained layer single or multiple quantum well lasers include an InP substrate, a pair of lattice-matched InGaAsP quarternary layers epitaxially grown on the substrate surrounding a pair of lattice matched In.sub.0.53 Ga.sub.0.47 As ternary layers surrounding one or more strained active layers of epitaxially grown, lattice-mismatched In.sub.0.75 Ga.sub.0.25 As. The level of strain is selected to control the bandgap energy to produce laser output having a wavelength in the range of 1.6 to 2.5 .mu.m. The multiple quantum well structure uses between each active layer. Diethyl zinc is used for p-type dopant in an InP cladding layer at a concentration level in the range of about 5.times.10.sup.17 /cm.sup.3 to about 2.times.10.sup.18 /cm.sup.3. Hydrogen sulfide is used for n-type dopant in the substrate.
Document ID
20080005944
Acquisition Source
Headquarters
Document Type
Other - Patent
Authors
Forouhar, Siamak
Larsson, Anders G.
Ksendzov, Alexander
Lang, Robert J.
Date Acquired
August 24, 2013
Publication Date
October 26, 1993
Subject Category
Lasers And Masers
Report/Patent Number
Patent Number: US-PATENT-5,257,276
Patent Application Number: US-PATENT-APPL-SN-862722
Distribution Limits
Public
Copyright
Work of the US Gov. Public Use Permitted.
Patent
US-PATENT-5,257,276
Patent Application
US-PATENT-APPL-SN-862722
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