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Silicon carbide thyristorThe SiC thyristor has a substrate, an anode, a drift region, a gate, and a cathode. The substrate, the anode, the drift region, the gate, and the cathode are each preferably formed of silicon carbide. The substrate is formed of silicon carbide having one conductivity type and the anode or the cathode, depending on the embodiment, is formed adjacent the substrate and has the same conductivity type as the substrate. A drift region of silicon carbide is formed adjacent the anode or cathode and has an opposite conductivity type as the anode or cathode. A gate is formed adjacent the drift region or the cathode, also depending on the embodiment, and has an opposite conductivity type as the drift region or the cathode. An anode or cathode, again depending on the embodiment, is formed adjacent the gate or drift region and has an opposite conductivity type than the gate.
Document ID
20080006976
Acquisition Source
Legacy CDMS
Document Type
Other - Patent
Authors
Edmond, John A.
Palmour, John W.
Date Acquired
August 24, 2013
Publication Date
July 23, 1996
Subject Category
Solid-State Physics
Report/Patent Number
Patent Application Number: US-PATENT-APPL-SN-103866
Patent Number: US-PATENT-5,539,217
Funding Number(s)
CONTRACT_GRANT: NAS3-26594
Distribution Limits
Public
Copyright
Work of the US Gov. Public Use Permitted.
Patent
US-PATENT-5,539,217
Patent Application
US-PATENT-APPL-SN-103866
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