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Memory switches based on metal oxide thin filmsMnO.sub.2-x thin films (12) exhibit irreversible memory switching (28) with an OFF/ON resistance ratio of at least about 10.sup.3 and the tailorability of ON state (20) resistance. Such films are potentially extremely useful as a connection element in a variety of microelectronic circuits and arrays (24). Such films provide a pre-tailored, finite, non-volatile resistive element at a desired place in an electric circuit, which can be electrically turned OFF (22) or disconnected as desired, by application of an electrical pulse. Microswitch structures (10) constitute the thin film element, contacted by a pair of separate electrodes (16a, 16b) and have a finite, pre-selected ON resistance which is ideally suited, for example, as a programmable binary synaptic connection for electronic implementation of neural network architectures. The MnO.sub.2-x microswitch is non-volatile, patternable, insensitive to ultraviolet light, and adherent to a variety of insulating substrates (14), such as glass and silicon dioxide-coated silicon substrates.
Document ID
20080008764
Acquisition Source
Headquarters
Document Type
Other - Patent
Authors
Ramesham, Rajeshuni
Thakoor, Anilkumar P.
Lambe, John J.
Date Acquired
August 24, 2013
Publication Date
June 5, 1990
Subject Category
Metals And Metallic Materials
Report/Patent Number
Patent Number: US-Patent-4,931,763
Patent Application Number: US-Patent-Appl-SN-157318
Distribution Limits
Public
Copyright
Work of the US Gov. Public Use Permitted.
Patent
US-Patent-4,931,763
Patent Application
US-Patent-Appl-SN-157318
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