NASA Logo

NTRS

NTRS - NASA Technical Reports Server

Press Enter or click the Search button to begin your search.

Back to Results
Slotted antenna waveguide plasma sourceA high density plasma generated by microwave injection using a windowless electrodeless rectangular slotted antenna waveguide plasma source has been demonstrated. Plasma probe measurements indicate that the source could be applicable for low power ion thruster applications, ion implantation, and related applications. This slotted antenna plasma source invention operates on the principle of electron cyclotron resonance (ECR). It employs no window and it is completely electrodeless and therefore its operation lifetime is long, being limited only by either the microwave generator itself or charged particle extraction grids if used. The high density plasma source can also be used to extract an electron beam that can be used as a plasma cathode neutralizer for ion source beam neutralization applications.
Document ID
20080009435
Acquisition Source
Headquarters
Document Type
Other - Patent
Authors
Foster, John
Date Acquired
August 24, 2013
Publication Date
December 11, 2007
Subject Category
Plasma Physics
Report/Patent Number
Patent Number: US-Patent-7,305,935
Patent Application Number: US-Patent-Appl-SN-10/925,499
Distribution Limits
Public
Copyright
Work of the US Gov. Public Use Permitted.
Patent
US-Patent-7,305,935
Patent Application
US-Patent-Appl-SN-10/925,499
No Preview Available