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Schottky barrier diode and method thereofPt/n.sup.-GaN Schottky barrier diodes are disclosed that are particularly suited to serve as ultra-violet sensors operating at wavelengths below 200 nm. The Pt/n.sup.-GaN Schottky barrier diodes have very large active areas, up to 1 cm.sup.2, which exhibit extremely low leakage current at low reverse biases. Very large area Pt/n.sup.-GaN Schottky diodes of sizes 0.25 cm.sup.2 and 1 cm.sup.2 have been fabricated from n.sup.-/n.sup.+ GaN epitaxial layers grown by vapor phase epitaxy on single crystal c-plane sapphire, which showed leakage currents of 14 pA and 2.7 nA, respectively for the 0.25 cm.sup.2 and 1 cm.sup.2 diodes both configured at a 0.5V reverse bias.
Document ID
20080020434
Acquisition Source
Headquarters
Document Type
Other - Patent
Authors
Aslam, Shahid
Franz, David
Date Acquired
August 24, 2013
Publication Date
March 11, 2008
Subject Category
Electronics And Electrical Engineering
Report/Patent Number
Patent Number: US-Patent-7,341,932
Patent Application Number: US-Patent-Appl-SN-11/251,531
Distribution Limits
Public
Copyright
Work of the US Gov. Public Use Permitted.
Patent
US-Patent-7,341,932
Patent Application
US-Patent-Appl-SN-11/251,531
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