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Oxygen Plasma Modification of Poss-Coated Kapton(Registered TradeMark) HN FilmsThe surface energy of a material depends on both surface composition and topographic features. In an effort to modify the surface topography of Kapton(Registered TradeMark) HN film, organic solutions of a polyhedral oligomeric silsesquioxane, octakis(dimethylsilyloxy)silsesquioxane (POSS), were spray-coated onto the Kapton(Registered TradeMark) HN surface. Prior to POSS application, the Kapton(Registered TradeMark) HN film was activated by exposure to radio frequency (RF)-generated oxygen plasma. After POSS deposition and solvent evaporation, the films were exposed to various durations of RF-generated oxygen plasma to create a topographically rich surface. The modified films were characterized using optical microscopy, attenuated total reflection infrared (ATR-IR) spectroscopy, and high-resolution scanning electron microscopy (HRSEM). The physical properties of the modified films will be presented.
Document ID
20080020521
Acquisition Source
Langley Research Center
Document Type
Conference Paper
Authors
Wohl, C. J. (NASA Langley Research Center Hampton, VA, United States)
Belcher, M. A. (National Inst. of Aerospace Associates Hampton, VA, United States)
Ghose, S. (National Inst. of Aerospace Associates Hampton, VA, United States)
Connell, J. W. (NASA Langley Research Center Hampton, VA, United States)
Date Acquired
August 24, 2013
Publication Date
May 18, 2008
Subject Category
Nonmetallic Materials
Meeting Information
Meeting: SAMPE ''08 Material and Process Innovations: Changing our World
Location: Long Beach, CA
Country: United States
Start Date: May 18, 2008
End Date: May 22, 2008
Sponsors: Society for the Advancement of Materials and Process Engineering
Funding Number(s)
WBS: WBS 09283704020104
Distribution Limits
Public
Copyright
Work of the US Gov. Public Use Permitted.

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