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Large area plasma sourceAn all permanent magnet Electron Cyclotron Resonance, large diameter (e.g., 40 cm) plasma source suitable for ion/plasma processing or electric propulsion, is capable of producing uniform ion current densities at its exit plane at very low power (e.g., below 200 W), and is electrodeless to avoid sputtering or contamination issues. Microwave input power is efficiently coupled with an ionizing gas without using a dielectric microwave window and without developing a throat plasma by providing a ferromagnetic cylindrical chamber wall with a conical end narrowing to an axial entrance hole for microwaves supplied on-axis from an open-ended waveguide. Permanent magnet rings are attached inside the wall with alternating polarities against the wall. An entrance magnet ring surrounding the entrance hole has a ferromagnetic pole piece that extends into the chamber from the entrance hole to a continuing second face that extends radially across an inner pole of the entrance magnet ring.
Document ID
20090002654
Acquisition Source
Headquarters
Document Type
Other - Patent
Authors
Foster, John
Patterson, Michael
Date Acquired
August 24, 2013
Publication Date
July 15, 2008
Subject Category
Plasma Physics
Report/Patent Number
Patent Number: US-Patent-7,400,096
Patent Number: NASA-Case-LEW-17561-1
Patent Application Number: US-Patent-Appl-SN-10/894,225
Distribution Limits
Public
Copyright
Work of the US Gov. Public Use Permitted.
Patent
US-Patent-7,400,096|NASA-Case-LEW-17561-1
Patent Application
US-Patent-Appl-SN-10/894,225
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