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Method for fabricating a microscale anemometerMethod for fabricating a microscale anemometer on a substrate. A sacrificial layer is formed on the substrate, and a metal thin film is patterned to form a sensing element. At least one support for the sensing element is patterned. The sacrificial layer is removed, and the sensing element is lifted away from the substrate by raising the supports, thus creating a clearance between the sensing element and the substrate to allow fluid flow between the sensing element and the substrate. The supports are raised preferably by use of a magnetic field applied to magnetic material patterned on the supports.
Document ID
20090006102
Acquisition Source
Goddard Space Flight Center
Document Type
Other - Patent
Authors
Liu, Chang
Chen, Jack
Date Acquired
August 24, 2013
Publication Date
November 18, 2008
Subject Category
Instrumentation And Photography
Report/Patent Number
Patent Application Number: US-Patent-Appl-SN-11/132,144
Patent Number: US-Patent-7,451,537
Funding Number(s)
CONTRACT_GRANT: NAG5-8781
Distribution Limits
Public
Copyright
Work of the US Gov. Public Use Permitted.
Patent
US-Patent-7,451,537
Patent Application
US-Patent-Appl-SN-11/132,144
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