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Method for implementation of back-illuminated CMOS or CCD imagersA method for implementation of back-illuminated CMOS or CCD imagers. An oxide layer buried between silicon wafer and device silicon is provided. The oxide layer forms a passivation layer in the imaging structure. A device layer and interlayer dielectric are formed, and the silicon wafer is removed to expose the oxide layer.
Document ID
20090006603
Acquisition Source
Headquarters
Document Type
Other - Patent
Authors
Pain, Bedabrata
Date Acquired
August 24, 2013
Publication Date
September 16, 2008
Subject Category
Launch Vehicles And Launch Operations
Report/Patent Number
Patent Number: US-Patent-7,425,460
Patent Application Number: US-Patent-Appl-SN-11/226,902
Distribution Limits
Public
Copyright
Work of the US Gov. Public Use Permitted.
Patent
US-Patent-7,425,460
Patent Application
US-Patent-Appl-SN-11/226,902

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