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Modification of the Surface Properties of Polyimide Films using POSS Deposition and Oxygen Plasma ExposureTopographically rich surfaces were generated by spray-coating organic solutions of a polyhedral oligomeric silsesquioxane, octakis (dimethylsilyloxy) silsesquioxane (POSS), on Kapton HN films and exposing them to radio frequency generated oxygen plasma. Changes in both surface chemistry and topography were observed. High-resolution scanning electron microscopy indicated substantial modification of the POSS-coated polyimide surface topographies as a result of oxygen plasma exposure. Water contact angles varied from 104 deg for unexposed POSS-coated surfaces to approximately 5 deg, for samples exposed for 5 h. Modulation of the dispersive and polar contributions to the surface energy was determined using van Oss Good Chaudhury theory.
Document ID
20090026494
Acquisition Source
Langley Research Center
Document Type
Preprint (Draft being sent to journal)
Authors
Wohl, Christopher J.
(NASA Langley Research Center Hampton, VA, United States)
Belcher, Marcus A.
(National Inst. of Aerospace Hampton, VA, United States)
Ghose, Sayata
(National Inst. of Aerospace Hampton, VA, United States)
Connell, John W.
(NASA Langley Research Center Hampton, VA, United States)
Date Acquired
August 24, 2013
Publication Date
January 1, 2008
Publication Information
Publication: Journal of Applied Surface Science
Publisher: Elsevier B.V.
Volume: 255
Issue: 18
Subject Category
Nonmetallic Materials
Report/Patent Number
LF99-7904
Report Number: LF99-7904
Funding Number(s)
WBS: WBS 092837.04.02.01.04
Distribution Limits
Public
Copyright
Public Use Permitted.
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