Design of an Integrated-System FARAD Thruster

Pulsed inductive plasma accelerators are spacecraft propulsion devices in which energy is stored in a capacitor and then discharged through an inductive coil. The device is electrodeless, inducing a current s heet in a plasma located near the face of the coil. The propellant is accelerated and expelled at a high exhaust velocity (order of 10 km/s) through the interaction of the plasma current and the induced magne tic field, The Faraday Accelerator with RF-Assisted Discharge (FARAD) thruster is a type of pulsed inductive plasma accelerator in which t he plasma is preionized by a mechanism separate from that used to for m the current sheet and accelerate the gas. Employing a separate preionization mechanism allows for the formation of an inductive current s heet at much lower discharge energies and voltages than those used in previous pulsed inductive accelerators like the Pulsed Inductive Thr uster (PIT). In this paper, we present the design of a benchtop FARAD thruster with all the subsystems (mass injection, preionization, and acceleration) integrated into a single unit. Design of the thruster follows the guidelines and similarity performance parameters presented elsewhere. The system is designed to use the ringing, RF-frequency s ignal produced by a discharging Vector Inversion Generator (VIG) to p reionize the gas. The acceleration stage operates on the order of 100 J/pulse and can be driven by several different pulsed powertrains. These include a simple capacitor coupled to the system, a Bernardes and Merryman configuration, and a pulsecompression circuit that takes a temporally broad, low current pulse and transforms it into a short, h igh current pulse. A set of applied magnetic field coils are integrated into the system to guide the preionized propellant as it spreads ov er the face of the inductive acceleration coil. The coils are operate d in a pulsed mode, and the thruster can be operated without using the coils to determine if there is a performance improvement gain realiz ed when an applied field is present.