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Systems and methods for correcting optical reflectance measurementsWe disclose measurement systems and methods for measuring analytes in target regions of samples that also include features overlying the target regions. The systems include: (a) a light source; (b) a detection system; (c) a set of at least first, second, and third light ports which transmit light from the light source to a sample and receive and direct light reflected from the sample to the detection system, generating a first set of data including information corresponding to both an internal target within the sample and features overlying the internal target, and a second set of data including information corresponding to features overlying the internal target; and (d) a processor configured to remove information characteristic of the overlying features from the first set of data using the first and second sets of data to produce corrected information representing the internal target.
Document ID
20100009033
Acquisition Source
Johnson Space Center
Document Type
Other - Patent
Authors
Yang, Ye
Soller, Babs R.
Soyemi, Olusola O.
Shear, Michael A.
Date Acquired
August 25, 2013
Publication Date
November 10, 2009
Subject Category
Optics
Report/Patent Number
Patent Number: US-Patent-7,616,303
Patent Application Number: US-Patent-Appl-SN-11/411,538
Funding Number(s)
CONTRACT_GRANT: NCC9-58
Distribution Limits
Public
Copyright
Work of the US Gov. Public Use Permitted.
Patent
US-Patent-7,616,303
Patent Application
US-Patent-Appl-SN-11/411,538
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