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High internal free volume compositions for low-k dielectric and other applicationsThe present invention provides materials, devices, and methods involving new heterocyclic, shape-persistent monomeric units with internal free volume. In some cases, materials the present invention may comprise monomers, oligomers, or polymers that incorporate a heterocyclic, shape-persistent iptycene. The present invention may provide materials having low dielectric constants and improved stability at high operating temperatures due to the electron-poor character of materials. In addition, compositions of the invention may be easily synthesized and readily modified to suit a particular application.
Document ID
20100015713
Acquisition Source
Ames Research Center
Document Type
Other - Patent
Authors
Swager, Timothy M.
Bouffard, Jean
Date Acquired
August 24, 2013
Publication Date
March 2, 2010
Subject Category
Electronics And Electrical Engineering
Report/Patent Number
Patent Number: US-Patent-7,671,166
Patent Application Number: US-Patent-Appl-SN-11/336,417
Funding Number(s)
CONTRACT_GRANT: NAS2-02056
Distribution Limits
Public
Copyright
Work of the US Gov. Public Use Permitted.
Patent
US-Patent-7,671,166
Patent Application
US-Patent-Appl-SN-11/336,417
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