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Parylene C as a Sacrificial Material for MicrofabricationParylene C has been investigated for use as a sacrificial material in microfabrication. Although Parylene C cannot be patterned lithographically like photoresists, it nevertheless extends the range of processing options by offering a set of properties that are suitable for microfabrication and are complementary to those of photoresists. The compatibility of Parylene C with several microfabrication processes was demonstrated in experiments in which a thin film of Parylene C was deposited on a silicon wafer, then several thin metal films were deposited and successfully patterned, utilizing the Parylene C pads as a sacrificial layer. The term "parylene" -- a contraction of "poly(para-xylene)" -- denotes a family of vapor-deposited polymers. In Parylene C (the most common form of parylene), a chlorine atom is substituted for one of the hydrogen atoms on the benzene ring of each para-xylene moiety. Heretofore, parylenes have been used as conformal coating materials in diverse applications.
Document ID
20110014917
Acquisition Source
Goddard Space Flight Center
Document Type
Other - NASA Tech Brief
Authors
Beamesderfer, Michael
(NASA Goddard Space Flight Center Greenbelt, MD, United States)
Date Acquired
August 25, 2013
Publication Date
June 1, 2005
Publication Information
Publication: NASA Tech Briefs, June 2005
Subject Category
Chemistry And Materials (General)
Report/Patent Number
GSC-14803-1
Report Number: GSC-14803-1
Distribution Limits
Public
Copyright
Public Use Permitted.
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