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Method of fabricating a whispering gallery mode resonatorA method of fabricating a whispering gallery mode resonator (WGMR) is provided. The WGMR can be fabricated from a particular material, annealed, and then polished. The WGMR can be repeatedly annealed and then polished. The repeated polishing of the WGMR can be carried out using an abrasive slurry. The abrasive slurry can have a predetermined, constant grain size. Each subsequent polishing of the WGMR can use an abrasive slurry having a grain size that is smaller than the grain size of the abrasive slurry of the previous polishing iteration.
Document ID
20110023519
Acquisition Source
Headquarters
Document Type
Other - Patent
Authors
Savchenkov, Anatoliy A.
Matkso, Andrey B.
Iltchenko, Vladimir S.
Maleki, Lute
Date Acquired
August 25, 2013
Publication Date
November 15, 2011
Subject Category
Electronics And Electrical Engineering
Report/Patent Number
Patent Application Number: US-Patent-Appl-SN-12/119,989
Patent Number: US-Patent-8,057,283
Distribution Limits
Public
Copyright
Work of the US Gov. Public Use Permitted.
Patent
US-Patent-8,057,283
Patent Application
US-Patent-Appl-SN-12/119,989

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