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Electrospray Collection of Lunar DustA report describes ElectroSpray Ionization based Electrostatic Precipitation (ESIEP) for collecting lunar dust particles. While some HEPA filtration processes may remove a higher fraction (>99.9 percent) of the particles, the high efficiency may not be appropriate from an overall system standpoint, especially in light of the relatively large power requirement that such systems demand. The new electrospray particle capture technology is described as a variant of electrostatic precipitation that eliminates the current drawbacks of electrostatic precipitation. The new approach replaces corona prone field with a mist of highly charged micro-droplets generated by electrospray ionization (ESI) as the mechanism by which incoming particles are attracted and captured. In electrospray, a miniscule flow rate (microliters/minute) of liquid (typically water and a small amount of salt to enhance conductivity) is fed from the tip of a needle held at a high voltage potential relative to an opposite counter electrode. At sufficient field strength, a sharp liquid meniscus forms , which emits a jet of highly charged droplets that drift through the surrounding gas and are collected on the walls of a conductive tube. Particles in the gas have a high probability of contact with the droplets either by adhering to the droplets or otherwise acquiring a high level of charge, causing them to be captured on the collecting electrode as well. The spray acts as a filtration material that is continuously introduced and removed from the gas flow, and thus can never become clogged.
Document ID
20120006574
Acquisition Source
Glenn Research Center
Document Type
Other - NASA Tech Brief
Authors
Dziekan, Michael
(Connecticut Analytical Corp. Bethany, CT, United States)
Date Acquired
August 25, 2013
Publication Date
January 1, 2012
Publication Information
Publication: NASA Tech Briefs, January 2012
Subject Category
Engineering (General)
Report/Patent Number
LEW-18629-1
Distribution Limits
Public
Copyright
Public Use Permitted.
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