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Closed-Loop Process Control for Electron Beam Freeform Fabrication and Deposition ProcessesA closed-loop control method for an electron beam freeform fabrication (EBF(sup 3)) process includes detecting a feature of interest during the process using a sensor(s), continuously evaluating the feature of interest to determine, in real time, a change occurring therein, and automatically modifying control parameters to control the EBF(sup 3) process. An apparatus provides closed-loop control method of the process, and includes an electron gun for generating an electron beam, a wire feeder for feeding a wire toward a substrate, wherein the wire is melted and progressively deposited in layers onto the substrate, a sensor(s), and a host machine. The sensor(s) measure the feature of interest during the process, and the host machine continuously evaluates the feature of interest to determine, in real time, a change occurring therein. The host machine automatically modifies control parameters to the EBF(sup 3) apparatus to control the EBF(sup 3) process in a closed-loop manner.
Document ID
20140016462
Acquisition Source
Headquarters
Document Type
Other - Patent
Authors
Taminger, Karen M.
Hafley, Robert A.
Martin, Richard E.
Hofmeister, William H.
Date Acquired
November 18, 2014
Publication Date
May 28, 2013
Subject Category
Mechanical Engineering
Report/Patent Number
Patent Number: US-Patent-8,452,073
Patent Application Number: US-Patent-Appl-SN-12/750,991
Distribution Limits
Public
Copyright
Work of the US Gov. Public Use Permitted.
Patent
US-Patent-8,452,073
Patent Application
US-Patent-Appl-SN-12/750,991
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