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Electrical Characterization of 4H-SiC JFET Wafer: DC Parameter Variations for Extreme Temperature IC DesignThis work reports DC electrical characterization of a 76 mm diameter 4H-SiC JFET test wafer fabricated as part of NASA's on-going efforts to realize medium-scale ICs with prolonged and stable circuit operation at temperatures as high as 500 degC. In particular, these measurements provide quantitative parameter ranges for use in JFET IC design and simulation. Larger than expected parameter variations were observed both as a function of position across the wafer as well as a function of ambient testing temperature from 23 degC to 500 degC.
Document ID
20150000740
Acquisition Source
Glenn Research Center
Document Type
Conference Paper
Authors
Neudeck, Philip G.
(NASA Glenn Research Center Cleveland, OH United States)
Chen, Liangyu
(Ohio Aerospace Inst. Cleveland, OH, United States)
Spry, David J.
(NASA Glenn Research Center Cleveland, OH United States)
Beheim, Glenn M.
(NASA Glenn Research Center Cleveland, OH United States)
Chang, Carl W.
(Vantage Partners, LLC Brook Park, OH, United States)
Date Acquired
January 26, 2015
Publication Date
September 21, 2014
Subject Category
Electronics And Electrical Engineering
Solid-State Physics
Report/Patent Number
GRC-E-DAA-TN16537
Meeting Information
Meeting: 2014 European Conference on Silicon Carbide and Related Materials
Location: Grenoble
Country: France
Start Date: September 21, 2014
End Date: September 25, 2014
Sponsors: ARC Energy
Funding Number(s)
CONTRACT_GRANT: NNC13BA10B
WBS: WBS 284848.02.04.03.02.01.01
CONTRACT_GRANT: NNC12BA01B
Distribution Limits
Public
Copyright
Public Use Permitted.
Keywords
Microelectronics
JFET
Silicon Carbides
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