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Tailorable Dielectric Material with Complex Permittivity CharacteristicsA dielectric material includes a network of nanosubstrates, such as but not limited to nanotubes, nanosheets, or other nanomaterials or nanostructures, a polymer base material or matrix, and nanoparticles constructed at least partially of an elemental metal. The network has a predetermined nanosubstrate loading percentage by weight with respect to a total weight of the dielectric material, and a preferential or predetermined longitudinal alignment with respect to an orientation of an incident electrical field. A method of forming the dielectric material includes depositing the metal-based nanoparticles onto the nanosubstrates and subsequently mixing these with a polymer matrix. Once mixed, alignment can be achieved by melt extrusion or a similar mechanical shearing process. Alignment of the nanosubstrate may be in horizontal or vertical direction with respect to the orientation of an incident electrical field.
Document ID
20150003333
Acquisition Source
Headquarters
Document Type
Other - Patent
Authors
Dudley, Kenneth L.
Elliott, Holly A
Connell, John W.
Smith, Joseph G.
Ghose, Sayata
Watson, Kent A.
Delozier, Donavon Mark
Date Acquired
March 19, 2015
Publication Date
July 29, 2014
Subject Category
Electronics And Electrical Engineering
Distribution Limits
Public
Copyright
Work of the US Gov. Public Use Permitted.
Patent
US-Patent-8,790,773
Patent Application
US-Patent-Appl-SN-12/174,360
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