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Rapid Solid-State Metathesis Routes to Nanostructured Silicon-GermainumMethods for producing nanostructured silicon and silicon-germanium via solid state metathesis (SSM). The method of forming nanostructured silicon comprises the steps of combining a stoichiometric mixture of silicon tetraiodide (SiI4) and an alkaline earth metal silicide into a homogeneous powder, and initating the reaction between the silicon tetraiodide (SiI4) with the alkaline earth metal silicide. The method of forming nanostructured silicon-germanium comprises the steps of combining a stoichiometric mixture of silicon tetraiodide (SiI4) and a germanium based precursor into a homogeneous powder, and initiating the reaction between the silicon tetraiodide (SiI4) with the germanium based precursors.
Document ID
20150003345
Acquisition Source
Headquarters
Document Type
Other - Patent
Authors
Kaner, Richard B.
Bux, Sabah K.
Fleurial, Jean-Pierre
Rodriguez, Marc
Date Acquired
March 20, 2015
Publication Date
August 19, 2014
Subject Category
Composite Materials
Report/Patent Number
Patent Application Number: US-Patent-Appl-SN-13/155,853
Patent Number: US-Patent-8,808,658
Funding Number(s)
CONTRACT_GRANT: NNX09AM26H
CONTRACT_GRANT: 0805357
CONTRACT_GRANT: 1308818
Distribution Limits
Public
Copyright
Work of the US Gov. Public Use Permitted.
Patent
US-Patent-8,808,658
Patent Application
US-Patent-Appl-SN-13/155,853
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