NASA Logo

NTRS

NTRS - NASA Technical Reports Server

Back to Results
High Precision Metal Thin Film Liftoff TechniqueA metal film liftoff process includes applying a polymer layer onto a silicon substrate, applying a germanium layer over the polymer layer to create a bilayer lift off mask, applying a patterned photoresist layer over the germanium layer, removing an exposed portion of the germanium layer, removing the photoresist layer and a portion of the polymer layer to expose a portion of the substrate and create an overhanging structure of the germanium layer, depositing a metal film over the exposed portion of the substrate and the germanium layer, and removing the polymer and germanium layers along with the overlaying metal film.
Document ID
20150014989
Acquisition Source
Headquarters
Document Type
Other - Patent
Authors
Brown, Ari D.
Patel, Amil A.
Date Acquired
August 3, 2015
Publication Date
July 7, 2015
Subject Category
Man/System Technology And Life Support
Report/Patent Number
Patent Application Number: US-Patent-Appl-SN-14/496,674
Patent Number: US-Patent-9,076,658
Distribution Limits
Public
Copyright
Work of the US Gov. Public Use Permitted.
Patent
US-Patent-9,076,658
Patent Application
US-Patent-Appl-SN-14/496,674
No Preview Available