Far-Infrared Dielectric Functions: Silicon Nitride (SiNx), Silicon Oxide (SiOx), and High-Purity Silicon (Si)

This work reports the numerical values of the dielectric functions derived from far-infrared measurements of silicon nitride, silicon oxide, and bulk high-purity silicon. These dielectric parameters have been previously reported in the literature and are presented here in a convenient form for future optical and sensor design applications.