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Nanometer X-ray LithographyNew developments for X-ray nanomachinging include pattern transfer onto non-planar surfaces coated with eletrodeposited resists using synchrotron radion X-rays through extremely high-resolution masks made by chemically assisted focused ion beam lithography.
Document ID
20210003031
Acquisition Source
Jet Propulsion Laboratory
Document Type
Other
External Source(s)
hdl:2014/18203
Authors
Malek, C.
Hartley, F.
Date Acquired
October 29, 1999
Publication Date
October 29, 1999
Publication Information
Publisher: UNKNOWN
Distribution Limits
Public
Copyright
Other
Technical Review
Keywords
X-rays
lithography
on
non-planar
surfaces
conformal
coating
large
depth-of-field
nanolithography

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