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Microfabrication Ion Acceleration Grid Design Issues: Electronic Breakdown Characteristics of Silicon Dioxide Insulator MaterialLow-temperature (LTO) chemical vapor deposited (CVD) silicon dioxide was investigated for use as an insulator matierial in microfabriacted ion engine accelerator grids.
Document ID
20210005579
Acquisition Source
Jet Propulsion Laboratory
Document Type
Other
External Source(s)
hdl:2014/20237
Authors
Lawton, R.
Tang, W.
Ruiz, R.
Chakraborty, I.
Pyle, D.
Mueller, J.
Date Acquired
July 13, 1998
Publication Date
July 13, 1998
Publication Information
Publisher: UNKNOWN
Distribution Limits
Public
Copyright
Other
Technical Review
Keywords
Low-Temperature
(LTO)
Chemical
vapor
deposited
(CVD)
silicon
dioxide
Microfabrication
Ion
Acceleration
Grid
Design
Insulator
Material

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