Characterization of NiC Multilayer Coating Stress for X-Ray Optic Applications

NiC multilayers have been identified as a promising coating design for hard X-ray astrophysical imaging applications enabling bandpass extension beyond the Pt K-edge of approximately 78 keV. However, these coatings are difficult to deposit with low interfacial roughness below a bilayer thickness of about 35 ˚A. Utilizing a DC magnetron sputtering system, NiC multilayer of varying d-spacings are deposited on flat Si wafers and characterized using 8.048 keV X-ray reflectometry measurements. The residual coating stress is also measured using interferometry. We investigate how deposition parameters affect both the coating quality (i.e. surface/interfacial roughness, density, etc.) and the residual coating stress. From these experimental results conducted on flat substrates, we employ FEM and ray trace simulations to determine how NiC multilayer stress could impact the figure, and therefore performance, of full shell X-ray optics.