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Space Rated High Voltage Plasma Generating SupplyThe use of plasma for in-situ resource utilization (ISRU) applications (such as water treatment, acid production, plant seed activation, biofilm sanitization, or waste gasification) is an active area of research at the KSC Applied Chemistry Lab (ACL). The generation of plasma for experimentation has thus far been done with lab-rated power supplies which are unsuitable for space applications, and no suitable supply is readily available for purchase. This project tackled the development of a low TRL prototype 500 W power supply intended for generating plasma in space. The design was based on similar power electronic circuits used for electric propulsion systems and was adapted for use in ISRU applications. This technology will enable KSC’s plasma-based ISRU related technologies to be demonstrated in the space environment.
Document ID
20240000528
Acquisition Source
Kennedy Space Center
Document Type
Other - Final Report Summary
Authors
Nathaniel Cain
(Kennedy Space Center Merritt Island, Florida, United States)
Christopher Bond
(Kennedy Space Center Merritt Island, Florida, United States)
Date Acquired
January 12, 2024
Publication Date
January 31, 2024
Subject Category
Plasma Physics
Report/Patent Number
CIF 23-3
Funding Number(s)
WBS: 295640
Distribution Limits
Public
Copyright
Work of the US Gov. Public Use Permitted.
Technical Review
NASA Technical Management
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