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Passivation Strategies for Far-Ultraviolet Al Mirrors Using Plasma-Based AlF3 Processing
External Source
chorus
Document Type
Version of Record
Authors
Maria Gabriela Sales
David R. Boris
Luis V. Rodriguez de Marcos
James L. Hart
Andrew C. Lang
Benjamin S. Albright
T. Jude Kessler
Edward J. Wollack
Manuel A. Quijada
Scott G. Walton
Virginia D. Wheeler
Date Acquired
October 26, 2026
Publication Date
March 9, 2025
Publication Information
Publication: Chemistry of Materials
Publisher: American Chemical Society (ACS)
Volume: 37
Issue: 18
ISSN: 0897-4756
e-ISSN: 1520-5002
DOI: 10.1021/acs.chemmater.5c01881
Funding Number(s)
funding: 20-APRA20-0093/ N0017322GTC0044
Distribution Limits
Public

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