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Colloidal Nanosurfactants for 3D Conformal Printing of 2D van der Waals Materials
External Source
chorus
Document Type
Version of Record
Authors
Minxiang Zeng (Department of Aerospace and Mechanical Engineering University of Notre Dame Notre Dame IN 46556 USA)
Wenzheng Kuang (Department of Aerospace and Mechanical Engineering University of Notre Dame Notre Dame IN 46556 USA)
Irfan Khan (Department of Electrical Engineering University of Notre Dame Notre Dame IN 46556 USA)
Dali Huang (Artie McFerrin Department of Chemical Engineering Texas A&M University College Station TX 77843 USA)
Yipu Du (Department of Aerospace and Mechanical Engineering University of Notre Dame Notre Dame IN 46556 USA)
Mortaza Saeidi‐Javash (Department of Aerospace and Mechanical Engineering University of Notre Dame Notre Dame IN 46556 USA)
Lecheng Zhang (Artie McFerrin Department of Chemical Engineering Texas A&M University College Station TX 77843 USA)
Zhengdong Cheng (Artie McFerrin Department of Chemical Engineering Texas A&M University College Station TX 77843 USA)
Anthony J. Hoffman (Department of Electrical Engineering University of Notre Dame Notre Dame IN 46556 USA)
Yanliang Zhang (Department of Aerospace and Mechanical Engineering University of Notre Dame Notre Dame IN 46556 USA)
Date Acquired
February 10, 2025
Publication Information
Publication: Advanced Materials
Publisher: Wiley
Volume: 32
Issue: 39
Issue Publication Date: October 1, 2020
ISSN: 0935-9648
e-ISSN: 1521-4095
DOI: 10.1002/adma.202003081
Funding Number(s)
funding: CMMI‐1747685
funding: DE‐NE0008712
funding: NNX13AQ60G
Distribution Limits
Public

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