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High resolution developing of photosensitive resists PatentComposition and process for improving definition of resin masks used in chemical etching
Document ID
19710008099
Acquisition Source
Legacy CDMS
Document Type
Other - Other
Authors
Taylor, C. J. (Westinghouse Electric Corp. Pittsburgh, PA, United States)
Date Acquired
August 6, 2013
Publication Date
July 29, 1969
Subject Category
Instrumentation And Photography
Report/Patent Number
Patent Number: US-PATENT-3,458,313
Patent Number: NASA-CASE-XGS-04993
Patent Application Number: US-PATENT-APPL-SN-577775
Accession Number
71N17574
Distribution Limits
Public
Copyright
Work of the US Gov. Public Use Permitted.
Patent
US-PATENT-3,458,313|NASA-CASE-XGS-04993
Patent Application
US-PATENT-APPL-SN-577775

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