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High-temperature strength stability of three forms of chemically vapor deposited tungstenThree types of CVD tungsten (fluoride-produced, chloride-produced, and a layered composite of the two-termed duplex) were evaluated to determine their high-temperature strength and microstructural stability following 5000-hr exposure to temperatures of 1540 and 1700 C. At the highest temperatures investigated (1540 and 1700 C), the tensile strengths of the two basic materials were essentially equal. At lower temperatures, chloride tungsten possessed lower yield strength but higher ultimate strength than fluoride tungsten while the behavior of the duplex material was generally intermediate. Apparent anomalies in high-temperature elongation behavior are explained on the basis of grain boundary cavity formation and recrystallization. The grain size of fluoride tungsten changed only slightly following 5000-h treatment at 1700 C. In contrast, chloride tungsten possessed both poor resistance to grain growth and an accompanying relatively high ductile-brittle transition temperature.
Document ID
19740056081
Acquisition Source
Legacy CDMS
Document Type
Reprint (Version printed in journal)
Authors
Bryant, W. A.
(Westinghouse Astronuclear Laboratory Pittsburgh, Pa., United States)
Date Acquired
August 7, 2013
Publication Date
August 1, 1974
Subject Category
Materials, Metallic
Accession Number
74A38831
Funding Number(s)
CONTRACT_GRANT: NAS3-13222
Distribution Limits
Public
Copyright
Other

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