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Zn diffusion in Al/0.7/Ga/0.3/As compared with that in GaAsZinc was diffused into 4 times 10 to the 17th per cu cm n-type Al(0.7)Ga(0.3)As grown by liquid-phase epitaxy and also into n-type 2 times 10 to the 17th per cu cm doped GaAs slices at 600, 650, and 750 C. The Zn diffusion coefficient in the Al(0.7)Ga(0.3)As was about one order of magnitude larger than in GaAs. The significance of this fact is that diffusion of Zn through a 0.5 micron Al(0.7)Ga(0.3)As layer appears to be possible with adequate control of the junction depth in the underlying GaAs.
Document ID
19780034138
Acquisition Source
Legacy CDMS
Document Type
Reprint (Version printed in journal)
Authors
Flat, A.
(Carnegie-Mellon Univ. Pittsburgh, PA, United States)
Milnes, A. G.
(Carnegie-Mellon Univ. Pittsburgh, PA, United States)
Feucht, D. L.
(Carnegie-Mellon University Pittsburgh, Pa., United States)
Date Acquired
August 9, 2013
Publication Date
December 1, 1977
Publication Information
Publication: Solid-State Electronics
Volume: 20
Subject Category
Solid-State Physics
Accession Number
78A18047
Distribution Limits
Public
Copyright
Other

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