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Record 1 of 6582
Nondestructive determination of the depth of planar p-n junctions by scanning electron microscopy
Author and Affiliation:
Chi, J.-Y.(Massachusetts Inst. of Tech., Cambridge, MA, United States)
Gatos, H. C.(MIT, Cambridge, Mass., United States)
Abstract: A method was developed for measuring nondestructively the depth of planar p-n junctions in simple devices as well as in integrated-circuit structures with the electron-beam induced current (EBIC) by scanning parallel to the junction in a scanning electron microscope (SEM). The results were found to be in good agreement with those obtained by the commonly used destructive method of lapping at an angle to the junction and staining to reveal the junction.
Publication Date: Dec 01, 1977
Document ID:
19780034377
(Acquired Dec 01, 1995)
Accession Number: 78A18286
Subject Category: ELECTRONICS AND ELECTRICAL ENGINEERING
Document Type: Journal Article
Publication Information: IEEE Transactions on Electron Devices; p. Dec. 197; ED-24
Publisher Information: United States
Financial Sponsor: NASA; United States
Organization Source: Massachusetts Inst. of Tech.; Cambridge, MA, United States
Description: 3p; In English
Distribution Limits: Unclassified; Publicly available; Unlimited
Rights: Copyright
NASA Terms: DEPTH MEASUREMENT; ELECTRON MICROSCOPES; INTEGRATED CIRCUITS; NONDESTRUCTIVE TESTS; P-N JUNCTIONS; PLANAR STRUCTURES; SCANNING ELECTRON MICROSCOPY; ELECTRICAL MEASUREMENT; ELECTRON BEAMS; ERROR ANALYSIS; SCANNING
Imprint And Other Notes: IEEE Transactions on Electron Devices, vol. ED-24, Dec. 1977, p. 1366-1368. NASA-supported research.
Miscellaneous Notes: p. 1366-1368. NASA-supported research
Availability Source: Other Sources
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