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Thirty-centimeter-diameter ion milling sourceA 30-cm beam diameter ion source has been designed and fabricated for micromachining and sputtering applications. An argon ion current density of 1 mA/cu cm at 500 eV ion energy was selected as a design operating condition. The completed ion source met the design criteria at this operating condition with a uniform and well-collimated beam having an average variation in current density of + or - 5% over the center of 20 cm of the beam. This ion source has a multipole magnetic field that employs permanent magnets between permeable pole pieces. Langmuir probe surveys of the source plasma support the design concepts of a multipole field and a circumferential cathode to enhance plasma uniformity.
Document ID
19780052125
Acquisition Source
Legacy CDMS
Document Type
Reprint (Version printed in journal)
Authors
Robinson, R. S.
(Colorado State University Fort Collins, Colo., United States)
Date Acquired
August 9, 2013
Publication Date
April 1, 1978
Subject Category
Mechanical Engineering
Accession Number
78A36034
Funding Number(s)
CONTRACT_GRANT: NSG-3086
Distribution Limits
Public
Copyright
Other

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