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A continuous silicon-coating facilityAutomatic continuous silicon-coating facility is used to process 100 by 10 cm graphite-coated ceramic substrates for silicon solar cells. Process reduces contamination associated with conventional dip-coating processes, improving material service life.
Document ID
19790000072
Acquisition Source
Legacy CDMS
Document Type
Other - NASA Tech Brief
Authors
Butter, C. (Honeywell Inc.)
Heaps, J. D. (Honeywell Inc.)
Date Acquired
August 10, 2013
Publication Date
August 1, 1979
Publication Information
Publication: NASA Tech Briefs
Volume: 4
Issue: 1
ISSN: 0145-319X
Subject Category
Materials
Report/Patent Number
NPO-14373
Accession Number
79B10072
Distribution Limits
Public
Copyright
Work of the US Gov. Public Use Permitted.

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