NASA Logo, External Link
Facebook icon, External Link to NASA STI page on Facebook Twitter icon, External Link to NASA STI on Twitter YouTube icon, External Link to NASA STI Channel on YouTube RSS icon, External Link to New NASA STI RSS Feed AddThis share icon
 

Record Details

Record 12 of 9572
Chemical-vapor-deposition reactor
Author and Affiliation:
Chern, S.
Abstract: Reactor utilizes multiple stacked trays compactly arranged in paths of horizontally channeled reactant gas streams. Design allows faster and more efficient deposits of film on substrates, and reduces gas and energy consumption. Lack of dead spots that trap reactive gases reduces reactor purge time.
Publication Date: Aug 01, 1979
Document ID:
19790000075
(Acquired Nov 04, 1995)
Accession Number: 79B10075
Subject Category: MATERIALS
Report/Patent Number: NPO-14137
Document Type: NASA Tech Brief
Publication Information: NASA Tech Briefs; p. P. 73; (ISSN 0145-319X); 4; 1
Publisher Information: United States
Financial Sponsor: NASA; United States
Organization Source: Jet Propulsion Lab., California Inst. of Tech.; Pasadena, CA, United States
Description: In English
Distribution Limits: Unclassified; Publicly available; Unlimited
Rights: No Copyright
NASA Terms: CHEMICAL REACTORS; GAS STREAMS; REACTORS; SEMICONDUCTING FILMS; SILANES; THIN FILMS; VAPOR DEPOSITION
Availability Source: National Technology Transfer Center (NTTC), Wheeling, WV
› Back to Top
Find Similar Records
NASA Logo, External Link
NASA Official: Gerald Steeman
Site Curator: STI Program
Last Modified: August 16, 2011
Contact Us