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Spectral studies of SiCl4 + N2O + Ar and SiH4 + Ar mixtures in a shock tube in 160-550 nm rangeGases containing SiO, SiO2, SiH, and Si2 were produced in the reflected-shock region of a shock tube by heating SiCl4 + N2O + Ar and SiH4 + Ar mixtures with shock waves. Spectral absorption characteristics were measured in the 160-550 nm wavelength range and in the 2800-3600 K temperature range and compared to calculated values. The sums of the squares of electronic transition moments at equilibrium separation were derived. It was found that absorption by SiO2 and other known bands of SiO, SiH, and Si2 were too weak to be measured. The cross section of absorption by a continuum, believed due to SiH, varied from 2.5 x 10 to the -17th sq cm at 280 nm to 1.6 x 10 to the -18th sq cm at 440 nm.
Document ID
19790031207
Acquisition Source
Legacy CDMS
Document Type
Conference Proceedings
Authors
Park, C.
(NASA Ames Research Center Moffett Field, CA, United States)
Fujiwara, T.
(NASA Ames Research Center Moffett Field, Calif., United States)
Date Acquired
August 9, 2013
Publication Date
January 1, 1978
Subject Category
Atomic And Molecular Physics
Meeting Information
Meeting: Shock tube and shock wave research; Eleventh International Symposium
Location: Seattle, WA
Start Date: July 11, 1977
End Date: July 14, 1977
Accession Number
79A15220
Distribution Limits
Public
Copyright
Other

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