Analysis of resistance-versus-pressure relations for the diamond indentor-anvil system

Pressures in excess of 1.4 Mbars have been attained by Ruoff and Wanagel (1977) by pressing tiny spherical diamond indentors (tip radius of 2 microns or less) against a diamond anvil. This system has been used for resistance-vs-pressure measurements as follows. A thin (200 A) coherent layer of a conductor, e.g., palladium, can be sputtered on the tip and on the anvil and electrical leads can then be attached to these at points remote from the contact area. Then a thin layer of the sample to be studied can be evaporated, sputtered, or placed on the anvil. When the indentor is pressed against the sample, the resistance changes as the pressure increases and as the contact radius increases. This paper analyzes the resistance-vs-pressure relationship for three different types of resistivity-vs-pressure behavior.