NASA Logo

NTRS

NTRS - NASA Technical Reports Server

Back to Results
Production technology for high efficiency ion implanted solar cellsIon implantation is being developed for high volume automated production of silicon solar cells. An implanter designed for solar cell processing and able to properly implant up to 300 4-inch wafers per hour is now operational. A machine to implant 180 sq m/hr of solar cell material has been designed. Implanted silicon solar cells with efficiencies exceeding 16% AM1 are now being produced and higher efficiencies are expected. Ion implantation and transient processing by pulsed electron beams are being integrated with electrostatic bonding to accomplish a simple method for large scale, low cost production of high efficiency solar cell arrays.
Document ID
19790056987
Acquisition Source
Legacy CDMS
Document Type
Conference Proceedings
Authors
Kirkpatrick, A. R.
(Spire Corp. Bedford, MA, United States)
Minnucci, J. A.
(Spire Corp. Bedford, MA, United States)
Greenwald, A. C.
(Spire Corp. Bedford, Mass., United States)
Josephs, R. H.
(California Institute of Technology, Jet Propulsion Laboratory, Pasadena Calif., United States)
Date Acquired
August 9, 2013
Publication Date
January 1, 1978
Subject Category
Energy Production And Conversion
Meeting Information
Meeting: Photovoltaic Specialists Conference
Location: Washington, DC
Start Date: June 5, 1978
End Date: June 8, 1978
Sponsors: U. S. Departement of Energy
Accession Number
79A41000
Distribution Limits
Public
Copyright
Other

Available Downloads

There are no available downloads for this record.
No Preview Available