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Automatic chemical vapor depositionReport reviews chemical vapor deposition (CVD) for processing integrated circuits and describes fully automatic machine for CVD. CVD proceeds at relatively low temperature, allows wide choice of film compositions (including graded or abruptly changing compositions), and deposits uniform films of controllable thickness at fairly high growth rate. Report gives overview of hardware, reactants, and temperature ranges used with CVD machine.
Document ID
19800000431
Acquisition Source
Legacy CDMS
Document Type
Other - NASA Tech Brief
Authors
Kennedy, B. W.
Date Acquired
August 10, 2013
Publication Date
January 1, 1981
Publication Information
Publication: NASA Tech Briefs
Volume: 5
Issue: 3
ISSN: 0145-319X
Subject Category
Fabrication Technology
Report/Patent Number
MFS-25249
Accession Number
80B10431
Distribution Limits
Public
Copyright
Work of the US Gov. Public Use Permitted.

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