The screen hole plasma sheath of an ion accelerator system

Results of the first probing of the screen hole sheath of an ion accelerator system are presented. The screen hole sheath, represented as a set of equipotential contours, extends over a large distance within the discharge plasma. Under no conditions examined does the sheath enter the screen hole. Edge hole defocusing of multiaperture accelerator systems is due primarily to local plasma density variations rather than adjacent screen hole sheath interactions. The sheath boundary is independent of screen-to-accelerator grid spacing when the grid set is operated at the minimum ion beam divergence condition. Significant ion focusing effects occur in the sheath adjacent to the screen grid webbing leading to increased ion source beam current efficiency with decreasing screen-to-accelerator grid separation and/or screen grid thickness.