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Development of RF sputtered chromium oxide coating for wear applicationThe radio frequency sputtering technique was used to deposite a hard refractory, chromium oxide coating on an Inconel X-750 foil 0.1 mm thick. Optimized sputtering parameters for a smooth and adherent coating were found to be as follows: target-to-substrate spacing, 41.3 mm; argon pressure, 5-10 mTorr; total power to the sputtering module, 400 W (voltage at the target, 1600 V), and a water-cooled substrate. The coating on the annealed foil was more adherent than that on the heat-treated foil. Substrate biasing during the sputter deposition of Cr2O3 adversely affected adherence by removing naturally occurring interfacial oxide layers. The deposited coatings were amorphous and oxygen deficient. Since amorphous materials are extremely hard, the structure was considered to be desirable.
Document ID
19800059362
Acquisition Source
Legacy CDMS
Document Type
Conference Proceedings
Authors
Bhushan, B.
(Mechanical Technology, Inc. Latham, N.Y., United States)
Date Acquired
August 10, 2013
Publication Date
January 1, 1979
Subject Category
Nonmetallic Materials
Meeting Information
Meeting: Metallurgical coatings 1979
Location: San Diego, CA
Start Date: August 23, 1979
End Date: August 27, 1979
Accession Number
80A43532
Funding Number(s)
CONTRACT_GRANT: DEN3-43
Distribution Limits
Public
Copyright
Other

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