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titanium dioxide antireflection coating for silicon solar cells by spray depositionA high-speed production process is described for depositing a single-layer, quarter-wavelength thick antireflection coating of titanium dioxide on metal-patterned single-crystal silicon solar cells for terrestrial applications. Controlled atomization spraying of an organotitanium solution was selected as the most cost-effective method of film deposition using commercial automated equipment. The optimal composition consists of titanium isopropoxide as the titanium source, n-butyl acetate as the diluent solvent, sec-butanol as the leveling agent, and 2-ethyl-1-hexanol to render the material uniformly depositable. Application of the process to the coating of circular, large-diameter solar cells with either screen-printed silver metallization or with vacuum-evaporated Ti/Pd/Ag metallization showed increases of over 40% in the electrical conversion efficiency. Optical characteristics, corrosion resistance, and several other important properties of the spray-deposited film are reported. Experimental evidence indicates a wide tolerance in the coating thickness upon the overall efficiency of the cell. Considerations pertaining to the optimization of AR coatings in general are discussed, and a comprehensive critical survey of the literature is presented.
Document ID
19810035362
Document Type
Reprint (Version printed in journal)
Authors
Kern, W.
(RCA Labs. Princeton, NJ, United States)
Tracy, E.
(RCA Laboratories Princeton, N.J., United States)
Date Acquired
August 11, 2013
Publication Date
June 1, 1980
Publication Information
Publication: RCA Review
Volume: 41
Subject Category
CHEMISTRY AND MATERIALS (GENERAL)
Funding Number(s)
CONTRACT_GRANT: JPL-954868
Distribution Limits
Public
Copyright
Other