Apparatus for high-pressure and low-temperature experiments

A new type of apparatus for high-pressure experiments at low temperature (1.5 K) is presented. It uses a flat diamond anvil with a spherical indentor. It utilizes a load ring placed under the sample, so that the load (and hence pressure) can be measured in situ at low temperature. The apparatus was successfully used to investigate the high-conductivity state of sulphur. It can be used to investigate other thin film samples.