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Record Details

Record 56 of 23458
A high frequency silicon pressure sensor
Author and Affiliation:
Kahng, S. K.(Oklahoma, University, Norman, Okla., United States)
Gross, C.(Pressure Systems, Inc., Hampton, Va., United States)
Abstract: Theoretical and design considerations as well as fabrication and experimental work involved in the development of high-frequency silicon pressure sensors with an ultra-small diaphragm are discussed. A sensor is presented with a rectangular diaphragm of 0.0127 cm x 0.0254 cm x 1.06 micron; the sensor has a natural frequency of 625 kHz and a sensitivity of 0.82 mv/v-psi. High-frequency results from shock tube testing and low-frequency (less than 50 kHz) comparison with microphones are given.
Publication Date: Jan 01, 1980
Document ID:
19810048442
(Acquired Nov 30, 1995)
Accession Number: 81A32846
Subject Category: INSTRUMENTATION AND PHOTOGRAPHY
Document Type: Conference Proceedings
Publication Information: (SEE A81-32826 14-35)
Publisher Information: United States
Meeting Information: International Instrumentation Symposium; 26th; May 5-8, 1980; Seattle, WA
Financial Sponsor: NASA; United States
Organization Source: Oklahoma Univ.; Norman, OK, United States
Description: 7p; In English
Distribution Limits: Unclassified; Publicly available; Unlimited
Rights: Copyright
NASA Terms: HIGH FREQUENCIES; PRESSURE SENSORS; RESONANT FREQUENCIES; SILICON; SPECTRAL SENSITIVITY; DESIGN ANALYSIS; FABRICATION; FREQUENCY RESPONSE; MICROPHONES; PIEZORESISTIVE TRANSDUCERS; SHOCK TUBES
Imprint And Other Notes: In: International Instrumentation Symposium, 26th, Seattle, Wash., May 5-8, 1980, Proceedings. Part 1. (A81-32826 14-35) Research Triangle Park, N.C., Instrument Society of America, 1980, p. 345-351. NASA-supported research.
Availability Source: Other Sources
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