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Silicide surface phases on goldThe crystalline silicide layers formed on (111) and (100) surfaces of Au films on various Si single-crystal substrates are studied by LEED and AES in conjunction with sputter-depth profiling as a function of annealing temperature. On the (111) surface, three basic silicide structures are obtained corresponding to layers of various thicknesses as obtained by different preparation conditions. The (100) surface shows only two different structures. None of the structures is compatible with the various bulk silicide structures deduced from X-ray diffraction. Using LEED as a criterion for the presence or absence of silicide on the surface, smaller layer thicknesses are obtained than reported previously on the basis of AES studies.
Document ID
19810061982
Acquisition Source
Legacy CDMS
Document Type
Reprint (Version printed in journal)
External Source(s)
Authors
Green, A. K.
(U.S. Naval Weapons Center Michelson Laboratory, China Lake, CA, United States)
Bauer, E.
(Clausthal, Technische Universitaet Clausthal-Zellerfeld, Germany)
Date Acquired
August 11, 2013
Publication Date
August 1, 1981
Publication Information
Publication: Journal of Applied Physics
Volume: 52
Subject Category
Nonmetallic Materials
Accession Number
81A46386
Funding Number(s)
CONTRACT_GRANT: NASA ORDER R-05-030-001
Distribution Limits
Public
Copyright
Other

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