Radiation effects on four polysulfone films

The response of polysulfones to proton and electron radiation is evaluated by assessing the radiation durability of four selected sulfones, establishing radiation interaction mechanisms with the polymer chain, and determining the dependence of radiation durability on chemical structure. Chain scission appears to predominate at lower doses up to about 10 to the 9th rad, and past this threshold the second mechanism, crosslinking, seems to predominate. This is evidenced by the increase in modulus, glass transition temperature, and increased quantity of thermally stable residue at high temperatures. The variations of chemical structure of the polysulfones appear to have little effect on the response to radiation.