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Photovoltaic properties of ferroelectric BaTiO3 thin films RF sputter deposited on siliconFerroelectric thin films of BaTiO3 have been successfully deposited on n-type silicon substrates at temperatures above 500 C by RF sputtering in an O2/Ar atmosphere. Analysis by X-ray diffraction patterns show that films deposited at room temperature are amorphous. At temperatures above 500 C, crystalline BaTiO3 films with a tetragonal structure are obtained. The polarization-electric field (P-E) hysteresis loops and a broad peak in the dielectric constant versus temperature curve at Curie point indicate that the RF sputtered BaTiO3 films are ferroelectric. An anomalous photovoltaic effect is observed in these thin films which is related to the remanent polarization of the material. The results on open-circuit and short-circuit measurements provide an important basis for a better understanding of the role of photovoltaic field, photovoltaic current, and the pyroelectric properties in photoferroelectric domain switching.
Document ID
19830034860
Acquisition Source
Legacy CDMS
Document Type
Reprint (Version printed in journal)
External Source(s)
Authors
Dharmadhikari, V. S.
(New Mexico Univ. Albuquerque, NM, United States)
Grannemann, W. W.
(New Mexico, University Albuquerque, NM, United States)
Date Acquired
August 11, 2013
Publication Date
December 1, 1982
Publication Information
Publication: Journal of Applied Physics
Volume: 53
Subject Category
Electronics And Electrical Engineering
Accession Number
83A16078
Funding Number(s)
CONTRACT_GRANT: NAG1-95
Distribution Limits
Public
Copyright
Other

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