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GaAs microwave devices and circuits with submicron electron-beam defined featuresThis paper describes the fabrication and application of GaAs FET's, both as discrete microwave devices and as the key active components in monolithic microwave integrated circuits. The performance of these devices and circuits is discussed for frequencies ranging from 3 to 25 GHz. The crucial fabrication step is the formation of the submicron gate by electron-beam lithography.
Document ID
19830055841
Acquisition Source
Legacy CDMS
Document Type
Reprint (Version printed in journal)
Authors
Wisseman, W. R.
(Texas Instruments, Inc. Dallas, TX, United States)
Macksey, H. M.
(Texas Instruments, Inc. Dallas, TX, United States)
Brehm, G. E.
(Texas Instruments, Inc. Dallas, TX, United States)
Saunier, P.
(Texas Instruments Central Research Laboratories Dallas, TX, United States)
Date Acquired
August 11, 2013
Publication Date
May 1, 1983
Publication Information
Publication: IEEE, Proceedings
Volume: 71
ISSN: 0018-9218
Subject Category
Electronics And Electrical Engineering
Accession Number
83A37059
Distribution Limits
Public
Copyright
Other

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