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Monolithic silicon bolometersA new type of bolometer detector for the millimeter and submillimeter spectral range is described. The bolometer is constructed of silicon using integrated circuit fabrication techniques. Ion implantation is used to give controlled resistance vs temperature properties as well as extremely low 1/f noise contacts. The devices have been tested between 4.2 and 0.3 K. The best electrical NEP measured is 4 x 10 to the -16th W/Hz to the 1/2 at 0.35 K between 1- and 10-Hz modulation frequency. This device had a detecting area of 0.25 sq cm and a time constant of 20 msec at a bath temperature of 0.35 K.
Document ID
19840046581
Acquisition Source
Legacy CDMS
Document Type
Reprint (Version printed in journal)
Authors
Downey, P. M.
(AT&T Bell Laboratories Holmdel, NJ, United States)
Jeffries, A. D.
(Massachusetts Inst. of Tech. Cambridge, MA, United States)
Meyer, S. S.
(Massachusetts Inst. of Tech. Cambridge, MA, United States)
Weiss, R.
(MIT Cambridge, MA, United States)
Bachner, F. J.
(Massachusetts Inst. of Tech. Cambridge, MA, United States)
Donnelly, J. P.
(Massachusetts Inst. of Tech. Cambridge, MA, United States)
Lindley, W. T.
(Massachusetts Inst. of Tech. Cambridge, MA, United States)
Mountain, R. W.
(Massachusetts Inst. of Tech. Cambridge, MA, United States)
Silversmith, D. J.
(MIT, Lincoln Laboratory, Lexington MA, United States)
Date Acquired
August 12, 2013
Publication Date
March 15, 1984
Publication Information
Publication: Applied Optics
Volume: 23
ISSN: 0003-6935
Subject Category
Instrumentation And Photography
Accession Number
84A29368
Distribution Limits
Public
Copyright
Other

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